Film Removal process
Silicon wafers which used for examination are insulating film or metal film are deposited. We are capable of removing film with chemical liquid depending on each film at our facility.
Checking all silicon wafers condition after silicon wafers film removal. Before polishing, we inspect thickness and other characteristics.
At polishing process, we are capable of adjust polishing in micron units. removing scratches and particles from the surface of the silicon wafers.
By doing this process, we make it possible to reclaim silicon wafers high standard.
After being polished, silicon wafers will be cleaned and particles and metallic impurity are removed.
All silicon wafers will be visual inspected. After that, Conducting measuring by particle counter.